Near-field sub-diffraction photolithography with an elastomeric photomask
Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a co...
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| Format: | Article |
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Nature Publishing Group
2020-02-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-020-14439-1 |
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doaj-1987c102c64a454185373731c0b8d2452021-05-11T08:22:37ZengNature Publishing GroupNature Communications2041-17232020-02-0111111310.1038/s41467-020-14439-1Near-field sub-diffraction photolithography with an elastomeric photomaskSangyoon Paik0Gwangmook Kim1Sehwan Chang2Sooun Lee3Dana Jin4Kwang-Yong Jeong5I Sak Lee6Jekwan Lee7Hongjae Moon8Jaejun Lee9Kiseok Chang10Su Seok Choi11Jeongmin Moon12Soonshin Jung13Shinill Kang14Wooyoung Lee15Heon-Jin Choi16Hyunyong Choi17Hyun Jae Kim18Jae-Hyun Lee19Jinwoo Cheon20Miso Kim21Jaemin Myoung22Hong-Gyu Park23Wooyoung Shim24Department of Materials Science and Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Physics, Korea UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Physics, Korea UniversitySchool of Electrical and Electronic Engineering, Yonsei UniversityDepartment of Physics and Astronomy, and Institute of Applied Physics, Seoul National UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversityR&D Center, LG DisplayDepartment of Electrical Engineering, Pohang University of Science and Technology (POSTECH)R&D Center, LG DisplayR&D Center, LG DisplaySchool of Mechanical Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Physics and Astronomy, and Institute of Applied Physics, Seoul National UniversitySchool of Electrical and Electronic Engineering, Yonsei UniversityCenter for NanoMedicine, Institute for Basic Science (IBS)Center for NanoMedicine, Institute for Basic Science (IBS)Center for Safety Measurement, Korea Research Institute of Standards and Science (KRISS)Department of Materials Science and Engineering, Yonsei UniversityDepartment of Physics, Korea UniversityDepartment of Materials Science and Engineering, Yonsei UniversityPhotolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.https://doi.org/10.1038/s41467-020-14439-1 |
| collection |
DOAJ |
| language |
English |
| format |
Article |
| sources |
DOAJ |
| author |
Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim |
| spellingShingle |
Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim Near-field sub-diffraction photolithography with an elastomeric photomask Nature Communications |
| author_facet |
Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim |
| author_sort |
Sangyoon Paik |
| title |
Near-field sub-diffraction photolithography with an elastomeric photomask |
| title_short |
Near-field sub-diffraction photolithography with an elastomeric photomask |
| title_full |
Near-field sub-diffraction photolithography with an elastomeric photomask |
| title_fullStr |
Near-field sub-diffraction photolithography with an elastomeric photomask |
| title_full_unstemmed |
Near-field sub-diffraction photolithography with an elastomeric photomask |
| title_sort |
near-field sub-diffraction photolithography with an elastomeric photomask |
| publisher |
Nature Publishing Group |
| series |
Nature Communications |
| issn |
2041-1723 |
| publishDate |
2020-02-01 |
| description |
Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach. |
| url |
https://doi.org/10.1038/s41467-020-14439-1 |
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