Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching

Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching

Selectively plasma-etched polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer masks present a promising alternative for subsequent nanoscale patterning of underlying films. Because mask roughness can be detrimental to pattern transfer, this study examines roughness formation, w...

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Bibliographic Details
Main Authors: Amy E. Wendt, Paul F. Nealey, Yuk-Hong Ting, Chi-Chun Liu, Sang-Min Park, Hongquan Jiang
Format: Article
Language:English
Published: MDPI AG 2010-12-01
Series:Polymers
Subjects:
diblock copolymer
plasma etching
surface roughness
cross-linking
polymer aggregation
Online Access:http://www.mdpi.com/2073-4360/2/4/649/

Internet

http://www.mdpi.com/2073-4360/2/4/649/

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