Research and improvement on the precision control of the stacked capacitance in NOR Flash
The precision control of the thickness of the ONO structure in NOR Flash device was discussed in the paper. The control of the thickness of the ONO structure became more precisely by means of normalizing the different density groups of devices, optimizing the optical measurement accuracy of multilay...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
Academic Journals Center of Shanghai Normal University
2020-08-01
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Series: | Journal of Shanghai Normal University (Natural Sciences) |
Subjects: | |
Online Access: | http://qktg.shnu.edu.cn/zrb/shsfqkszrb/ch/reader/view_abstract.aspx?file_no=20200415 |