Modeling of HCD Kinetics Under Full V<sub>G</sub> &#x2013; V<sub>D</sub> Space, Different Experimental Conditions and Across Different Device Architectures

A SPICE compatible compact modeling framework is discussed for Hot Carrier Degradation (HCD) stress spanning the entire drain (V<sub>D</sub>) and gate (V<sub>G</sub>) voltage space and wide range of temperature (T). It can model the HCD time kinetics measured using different...

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Bibliographic Details
Main Authors: Uma Sharma, Souvik Mahapatra
Format: Article
Language:English
Published: IEEE 2020-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
HCD
BTI
Online Access:https://ieeexplore.ieee.org/document/9207995/