Deposition of SiO<i><sub>x</sub></i>C<i><sub>y</sub></i>H<i><sub>z</sub></i> Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor

Deposition of SiO<i><sub>x</sub></i>C<i><sub>y</sub></i>H<i><sub>z</sub></i> Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor

The deposition of protective coatings on aluminised polymer substrates by a plasma enhanced chemical vapour deposition PECVD technique in a plasma reactor with a volume of 5 m<sup>3</sup> was studied. HMDSO was used as a precursor. Plasma was sustained in a capacitively coupled radiofreq...

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Bibliographic Details
Main Authors: Žiga Gosar, Janez Kovač, Miran Mozetič, Gregor Primc, Alenka Vesel, Rok Zaplotnik
Format: Article
Language:English
Published: MDPI AG 2019-04-01
Series:Coatings
Subjects:
plasma-enhanced chemical vapour deposition (PECVD)
hexamethyldisiloxane (HMDSO)
industrial-size plasma reactor
capacitively coupled radiofrequency (RF) discharge
optical emission spectroscopy (OES)
time-of-flight secondary ion mass spectrometry (ToF-SIMS)
X-ray photoelectron spectroscopy (XPS)
Online Access:https://www.mdpi.com/2079-6412/9/4/234

Internet

https://www.mdpi.com/2079-6412/9/4/234

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