Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

The integration of block copolymer (BCP) self-assembled nanopattern formation as an alternative lithographic tool for nanoelectronic device fabrication faces a number of challenges such as defect densities, feature size, pattern transfer, etc. Key barriers are the nanopattern process times and patte...

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Bibliographic Details
Main Authors: Dipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Justin D. Holmes, Michael A. Morris
Format: Article
Language:English
Published: MDPI AG 2015-03-01
Series:Polymers
Subjects:
polymer brush
block copolymer
silicon nitride substrate
solvothermal process
microwave anneal
self-assembly
graphoepitaxy
plasma etching
nanoscale patterns
Online Access:http://www.mdpi.com/2073-4360/7/4/592

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http://www.mdpi.com/2073-4360/7/4/592

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