The use of Highly Ionized Pulsed Plasmas for the Synthesis of Advanced Thin Films and Nanoparticles
Pulsed plasma processes open up the possibility of using very high plasma densities and modulated deposition in the synthesis of thin films and nanoparticles. The high plasma densities lead to a high degree of ionization of the source material...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hosokawa Powder Technology Foundation
2014-02-01
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| Series: | KONA Powder and Particle Journal |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/kona/31/0/31_2014008/_html/-char/en |