CoCrFeNi High-Entropy Alloy Thin Films Synthesised by Magnetron Sputter Deposition from Spark Plasma Sintered Targets

Two magnetron sputter targets of CoCrFeNi High-Entropy Alloy (HEA), both in equal atomic ratio, were prepared by spark plasma sintering. One of the targets was fabricated from a homogeneous HEA powder produced via gas atomisation; for the second target, a mixture of pure element powders was used. Ec...

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Bibliographic Details
Main Authors: Holger Schwarz, Thomas Uhlig, Niels Rösch, Thomas Lindner, Fabian Ganss, Olav Hellwig, Thomas Lampke, Guntram Wagner, Thomas Seyller
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/11/4/468