Structural and surface analysis of chemical vapor deposited boron doped aluminum nitride thin film on aluminum substrates
Chemical vapor deposition (CVD) process was conducted for synthesis of boron (B) doped aluminum nitride (B-AlN) thin films on aluminum (Al) substrates. To prevent melting of the Al substrates, film deposition was carried out at 500 °C using tert-buthylamine (tBuNH2) solution delivered through a bubb...
Main Authors: | , |
---|---|
Format: | Article |
Language: | English |
Published: |
Sciendo
2019-09-01
|
Series: | Materials Science-Poland |
Subjects: | |
Online Access: | https://doi.org/10.2478/msp-2019-0056 |