Structural and surface analysis of chemical vapor deposited boron doped aluminum nitride thin film on aluminum substrates

Chemical vapor deposition (CVD) process was conducted for synthesis of boron (B) doped aluminum nitride (B-AlN) thin films on aluminum (Al) substrates. To prevent melting of the Al substrates, film deposition was carried out at 500 °C using tert-buthylamine (tBuNH2) solution delivered through a bubb...

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Bibliographic Details
Main Authors: Subramani Shanmugan, Devarajan Mutharasu
Format: Article
Language:English
Published: Sciendo 2019-09-01
Series:Materials Science-Poland
Subjects:
cvd
Online Access:https://doi.org/10.2478/msp-2019-0056