Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD

Here we report on the structural and tribo-mechanical characterization of epitaxial single-crystalline Ti2AlC MAX phase thin films, grown by means of electron beam physical vapor deposition at relatively low temperature (700°C). The growth of phase pure Ti2AlC at a relatively lower temperature when...

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Main Authors:	A. V. Pshyk, E. Coy, M. Kempiński, B. Scheibe, S. Jurga
Format:	Article
Language:	English
Published:	Taylor & Francis Group 2019-06-01
Series:	Materials Research Letters
Subjects:	max phases pvd thin film growth nanoindentation low friction
Online Access:	http://dx.doi.org/10.1080/21663831.2019.1594428

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spelling	doaj-28f9013102da40258fc5c99fa55df82f2020-11-25T03:33:34ZengTaylor & Francis GroupMaterials Research Letters2166-38312019-06-017624425010.1080/21663831.2019.15944281594428Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVDA. V. Pshyk0E. Coy1M. Kempiński2B. Scheibe3S. Jurga4Adam Mickiewicz UniversityAdam Mickiewicz UniversityAdam Mickiewicz UniversityAdam Mickiewicz UniversityAdam Mickiewicz UniversityHere we report on the structural and tribo-mechanical characterization of epitaxial single-crystalline Ti2AlC MAX phase thin films, grown by means of electron beam physical vapor deposition at relatively low temperature (700°C). The growth of phase pure Ti2AlC at a relatively lower temperature when compared to other PVD methods was achieved utilizing a relatively low deposition rate and layer-by-layer deposition technique. The epitaxial growth is evidenced through the combination of XRD, HR-TEM and Raman spectroscopy measurements. The nanomechanical and micro-scale tribological properties of the Ti2AlC thin films were studied by means of nanoindentation and nanoscratch tests.http://dx.doi.org/10.1080/21663831.2019.1594428max phasespvdthin film growthnanoindentationlow friction
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	A. V. Pshyk E. Coy M. Kempiński B. Scheibe S. Jurga
spellingShingle	A. V. Pshyk E. Coy M. Kempiński B. Scheibe S. Jurga Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD Materials Research Letters max phases pvd thin film growth nanoindentation low friction
author_facet	A. V. Pshyk E. Coy M. Kempiński B. Scheibe S. Jurga
author_sort	A. V. Pshyk
title	Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
title_short	Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
title_full	Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
title_fullStr	Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
title_full_unstemmed	Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
title_sort	low-temperature growth of epitaxial ti2alc max phase thin films by low-rate layer-by-layer pvd
publisher	Taylor & Francis Group
series	Materials Research Letters
issn	2166-3831
publishDate	2019-06-01
description	Here we report on the structural and tribo-mechanical characterization of epitaxial single-crystalline Ti2AlC MAX phase thin films, grown by means of electron beam physical vapor deposition at relatively low temperature (700°C). The growth of phase pure Ti2AlC at a relatively lower temperature when compared to other PVD methods was achieved utilizing a relatively low deposition rate and layer-by-layer deposition technique. The epitaxial growth is evidenced through the combination of XRD, HR-TEM and Raman spectroscopy measurements. The nanomechanical and micro-scale tribological properties of the Ti2AlC thin films were studied by means of nanoindentation and nanoscratch tests.
topic	max phases pvd thin film growth nanoindentation low friction
url	http://dx.doi.org/10.1080/21663831.2019.1594428
work_keys_str_mv	AT avpshyk lowtemperaturegrowthofepitaxialti2alcmaxphasethinfilmsbylowratelayerbylayerpvd AT ecoy lowtemperaturegrowthofepitaxialti2alcmaxphasethinfilmsbylowratelayerbylayerpvd AT mkempinski lowtemperaturegrowthofepitaxialti2alcmaxphasethinfilmsbylowratelayerbylayerpvd AT bscheibe lowtemperaturegrowthofepitaxialti2alcmaxphasethinfilmsbylowratelayerbylayerpvd AT sjurga lowtemperaturegrowthofepitaxialti2alcmaxphasethinfilmsbylowratelayerbylayerpvd
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Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD

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