Application of hydrogen injection and oxidation to low temperature solution-processed oxide semiconductors

Solution-processed oxide semiconductors are promising candidates for the low cost, large scale fabrication of oxide thin-film transistors (TFTs). In this work, a method using hydrogen injection and oxidation (HIO) that allows the low temperature solution processing of oxide semiconductors was demons...

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Bibliographic Details
Main Authors: Masashi Miyakawa, Mitsuru Nakata, Hiroshi Tsuji, Yoshihide Fujisaki, Toshihiro Yamamoto
Format: Article
Language:English
Published: AIP Publishing LLC 2016-08-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4961711