The adsorptive-kinetic model of in-situ phosphorus doped film polysilicon deposition process
The investigation of deposition kinetics of in-situ phosphorus doped polysilicon films has been performed. The adsorptive-kinetic model of in-situ phosphorus doped polysilicon deposition has been developed. The values of heterogeneous reaction constants and constants, which describe the desorption p...
Main Authors: | , |
---|---|
Format: | Article |
Language: | English |
Published: |
Politehperiodika
2009-11-01
|
Series: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
Subjects: | |
Online Access: | http://www.tkea.com.ua/tkea/2009/6_2009/pdf/11.zip |