The Effect of Match between High Power Impulse and Bias Voltage: TiN Coating Deposited by High Power Impulse Magnetron Sputtering
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on the total energy output of the cathodes, which means that bias voltage settings do not necessarily match the actual output. In this study, we investigated t...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-07-01
|
| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/11/7/822 |