FinFET Performance Enhancement by Source/Drain Cavity Structure Optimization
Fin field-effect transistor (FinFET) technology has been introduced to the mainstream complementary metal-oxide semiconductor (CMOS) manufacturing for low-power and high-performance applications. However, advanced FinFET nodes are facing significant challenges to enhance the device performance due t...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
JommPublish
2020-06-01
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| Series: | Journal of Microelectronic Manufacturing |
| Subjects: | |
| Online Access: | http://www.jommpublish.com/p/52/ |