Delineation of Crystalline Extended Defects on Multicrystalline Silicon Wafers
We have selected Secco and Yang etch solutions for the crystalline defect delineation on multicrystalline silicon (mc-Si) wafers. Following experimentations and optimization of Yang and Secco etching process parameters, we have successfully revealed crystalline extended defects on mc-Si surfaces. A...
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| Format: | Article |
| Language: | English |
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Hindawi Limited
2007-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2007/18298 |