Modeling of discharges in a capacitively coupled dual frequency plasma reactor
In this paper we have modeled a dual frequency coupled plasma reactor (DF-CCP) by using a 1d3v PIC/MCC code. The obtained results apart from their theoretical relevance have practical applications especially for development of plasma reactors and for nanoelectronics. Dual frequency plasmas are used...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Association of Chemical Engineers of Serbia
2009-01-01
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| Series: | Hemijska Industrija |
| Subjects: | |
| Online Access: | http://www.doiserbia.nb.rs/img/doi/0367-598X/2009/0367-598X0903233B.pdf |