Efecto de la temperatura de deposición en las características estructurales y ópticas de películas delgadas de nitruro de boro obtenidas por CVD
Boron nitride (BN) thin films were deposited on silicon substrates by thermal CVD using mixtures of ammoniac and diborane. The effect of the deposition temperature (T) on the structural and optical characteristics of the BN samples was studied in the temperature range of 500 – 1000 oC. The depositio...
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| Format: | Article |
| Language: | English |
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Elsevier
2007-06-01
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| Series: | Boletín de la Sociedad Española de Cerámica y Vidrio |
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| Online Access: | http://ceramicayvidrio.revistas.csic.es/index.php/ceramicayvidrio/article/view/244/257 |