The resistive switching in TiO2 films studied by conductive atomic force microscopy and Kelvin probe force microscopy

The resistive switching in TiO2 films studied by conductive atomic force microscopy and Kelvin probe force microscopy

The resistive switching characteristics of TiO2 thin films were investigated using conductive atomic force microscopy (CAFM) and Kelvin probe force microscopy (KPFM). The as-prepared TiO2 thin films were modulated into higher and lower resistance states by applying a local electric field. We showed...

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Bibliographic Details
Main Authors: Yuanmin Du, Amit Kumar, Hui Pan, Kaiyang Zeng, Shijie Wang, Ping Yang, Andrew Thye Shen Wee
Format: Article
Language:English
Published: AIP Publishing LLC 2013-08-01
Series:AIP Advances
Online Access:http://link.aip.org/link/doi/10.1063/1.4818119

Internet

http://link.aip.org/link/doi/10.1063/1.4818119

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