Microstructure Evolution and Mechanical Behavior of Mo–Si–N Films

The molybdenum silicon nitride (Mo–Si–N) films were deposited by a radio frequency (RF) magnetron reactive dual-gun co-sputtering technique with process control on input power and gas ratio. Composition variation, microstructure evolution, and related mechanical and tribological behavior of the Mo–S...

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Bibliographic Details
Main Authors: Yu-Cheng Liu, Bing-Hao Liang, Chi-Ruei Huang, Fan-Bean Wu
Format: Article
Language:English
Published: MDPI AG 2020-10-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/10/10/987