Rolled-Up Nanotech: Illumination-Controlled Hydrofluoric Acid Etching of AlAs Sacrificial Layers

Rolled-Up Nanotech: Illumination-Controlled Hydrofluoric Acid Etching of AlAs Sacrificial Layers

<p>Abstract</p> <p>The effect of illumination on the hydrofluoric acid etching of AlAs sacrificial layers with systematically varied thicknesses in order to release and roll up InGaAs/GaAs bilayers was studied. For thicknesses of AlAs below 10 nm, there were two etching regimes for...

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Bibliographic Details
Main Authors: Costescu Ruxandra, Deneke Christoph, Thurmer Dominic, Schmidt Oliver
Format: Article
Language:English
Published: SpringerOpen 2009-01-01
Series:Nanoscale Research Letters
Subjects:
Rolled-up
Nanotubes
Nanotech
Nanostructures
Etching
Hydrofluoric acid
III&#8211;V layers
Illumination-controlled
Online Access:http://dx.doi.org/10.1007/s11671-009-9421-8

Internet

http://dx.doi.org/10.1007/s11671-009-9421-8

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