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Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Bibliographic Details
Main Authors: Mazur Michal, Kaczmarek Danuta, Prociow Eugeniusz, Domaradzki Jaroslaw, Wojcieszak Damian, Bocheński Jakub
Format: Article
Language:English
Published: Sciendo 2014-09-01
Series:Materials Science-Poland
Subjects:
(ti,nb)ox thin films
transparent oxide semiconductor
p-type electrical conduction
niobium doped titanium dioxide
transparent electronics
Online Access:https://doi.org/10.2478/s13536-013-0195-4
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https://doi.org/10.2478/s13536-013-0195-4

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