A Study of Quantum Confinement Effects in Ultrathin NiO Films Performed by Experiment and Theory

A Study of Quantum Confinement Effects in Ultrathin NiO Films Performed by Experiment and Theory

Ultrathin NiO films in the thickness range between 1 and 27 nm have been deposited on high-quality quartz substrates by direct magnetron sputtering under a rough vacuum with a base pressure of 2 × 10−2 mbar. The sputtering target was metallic Ni; however, due to the rough vacuum...

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Bibliographic Details
Main Authors: Christos S. Garoufalis, Alexandros Barnasas, Alkeos Stamatelatos, Vagelis Karoutsos, Spyridon Grammatikopoulos, Panagiotis Poulopoulos, Sotirios Baskoutas
Format: Article
Language:English
Published: MDPI AG 2018-06-01
Series:Materials
Subjects:
thin films
semiconductor oxides
grain growth
optical properties
quantum confinement
potential morphing method
Online Access:http://www.mdpi.com/1996-1944/11/6/949

Internet

http://www.mdpi.com/1996-1944/11/6/949

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