Structural and Optical Properties of Amorphous Al2O3 Thin Film Deposited by Atomic Layer Deposition
Aluminum oxide (Al2O3) amorphous structure with short-range order and long-range disorder has presented promising applications in optical and optoelectronic devices. In this paper, the Al2O3 films with different thickness were prepared by atomic layer deposition (ALD) technology at 200°C in order to...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2018-01-01
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| Series: | Advances in Condensed Matter Physics |
| Online Access: | http://dx.doi.org/10.1155/2018/7598978 |