Hydrogen-Assisted Sputtering Growth of TiN on Ceramic Substrates
Titanium nitride (TiN) has mechanical and electrical characteristics applicable for very large scale integration (VLSI) and discrete electronic devices. This study assessed the effect of hydrogen on sputtering growth of TiN on ceramic substrates. Although ceramic substrate is used in discrete device...
Main Authors: | , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2019-04-01
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Series: | Coatings |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-6412/9/4/255 |