Hydrogen-Assisted Sputtering Growth of TiN on Ceramic Substrates

Hydrogen-Assisted Sputtering Growth of TiN on Ceramic Substrates

Titanium nitride (TiN) has mechanical and electrical characteristics applicable for very large scale integration (VLSI) and discrete electronic devices. This study assessed the effect of hydrogen on sputtering growth of TiN on ceramic substrates. Although ceramic substrate is used in discrete device...

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Bibliographic Details
Main Authors:	Jaewon Choi, Wonjin Jeon, Dongjin Kang, Doowon Kang, Jungyol Jo
Format:	Article
Language:	English
Published:	MDPI AG 2019-04-01
Series:	Coatings
Subjects:	annealing ceramic substrate hydrogen sputtering titanium nitride X-ray diffraction
Online Access:	https://www.mdpi.com/2079-6412/9/4/255

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