Fabrication of HfO<sub>2 </sub>patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

Fabrication of HfO<sub>2 </sub>patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

<p>Abstract</p> <p>Nanostructuring of ultrathin HfO<sub>2 </sub>films deposited on GaAs (001) substrates by high-resolution Lloyd's mirror laser interference nanolithography is described. Pattern transfer to the HfO<sub>2 </sub>film was carried out by r...

Full description

Bibliographic Details
Main Authors: Molina-Aldareguia Jon, Monaghan Scott, Hurley Paul, Cherkaoui Karim, Benedicto Marcos, Galiana Beatriz, Vazquez Luis, Tejedor Paloma
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Online Access:http://www.nanoscalereslett.com/content/6/1/400

Internet

http://www.nanoscalereslett.com/content/6/1/400

Similar Items