Study on EEBS for linewidth imaging by a Monte Carlo method
A systematic analysis about the influences of electron beam focusing on scanning electron microscope (SEM) imaging for silicon (Si) trapezoidal lines was performed based on a sophisticated Monte Carlo (MC) simulation program. It was found that the focus position and the aperture angle highly affect...
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2019-12-01
|
| Series: | Results in Physics |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2211379719315748 |