Control of metal-insulator transition temperature in VO2 thin films grown on RuO2/TiO2 templates by strain modification

Ruthenium dioxide (RuO2) is an ideal buffer layer for vanadium dioxide (VO2) heterostructures due to its high electrical conductivity and matching crystal structure with metallic VO2. VO2 thin films were deposited on single crystal TiO2 (001) substrates with RuO2 buffer layers via pulsed laser depos...

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Bibliographic Details
Main Authors: H. Kim, N. A. Charipar, J. Figueroa, N. S. Bingham, A. Piqué
Format: Article
Language:English
Published: AIP Publishing LLC 2019-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5083848