Compact 13.5-nm free-electron laser for extreme ultraviolet lithography
Optical lithography has been actively used over the past decades to produce more and more dense integrated circuits. To keep with the pace of the miniaturization, light of shorter and shorter wavelength was used with time. The capabilities of the present 193-nm UV photolithography were expanded time...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
American Physical Society
2011-04-01
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| Series: | Physical Review Special Topics. Accelerators and Beams |
| Online Access: | http://doi.org/10.1103/PhysRevSTAB.14.040702 |