| Summary: | Silicon oxynitride (SiN<i><sub>x</sub></i>O<i><sub>y</sub></i>) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN<i><sub>x</sub></i>O<i><sub>y</sub></i> film. In particular, the preparation of SiN<i><sub>x</sub></i>O<i><sub>y</sub></i> film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
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