Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices

Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices

Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a...

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Bibliographic Details
Main Authors: D. Nishijima, A. Kreter, M.J. Baldwin, D. Borodin, A. Eksaeva, D. Hwangbo, S. Kajita, M. Miyamoto, N. Ohno, M. Patino, A. Pospieszczyk, M. Rasinski, T. Schlummer, A. Terra, R.P. Doerner
Format: Article
Language:English
Published: Elsevier 2019-01-01
Series:Nuclear Materials and Energy
Online Access:http://www.sciencedirect.com/science/article/pii/S2352179118300619

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http://www.sciencedirect.com/science/article/pii/S2352179118300619

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