Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a...
Main Authors: | , , , , , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2019-01-01
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Series: | Nuclear Materials and Energy |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2352179118300619 |