Comparison of Nano Structural Properties of Al2O3 and TiO2 Films
Recently, high – K materials such as Al2O3 and TiO2 films have been studied to replace ultra thin gate silicon dioxide film. In the present work, these films were grown on the top of Si(100) surface at different temperatures and under ultra high vacuum conditions. The obtained results showed that...
| Main Authors: | , , |
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| Format: | Article |
| Language: | fas |
| Published: |
Isfahan University of Technology
2012-06-01
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| Series: | Journal of Advanced Materials in Engineering |
| Subjects: | |
| Online Access: | http://jame.iut.ac.ir/article-1-536-en.html |