Underpotential and overpotential deposition of Al onto Cu(111) from the AlCl3–EtMeImCl room temperature molten salt

Underpotential and overpotential deposition of Al onto Cu(111) from the AlCl3–EtMeImCl room temperature molten salt

The processes of underpotential (UPD) and overpotential (OPD) deposition ofAl onto Cu(111), from the room temperature molten salt AlCl3–EtMeImCl of different compositions, has been investigated by the cyclic volatmmetry (CV) and potentiostatic pulse techniques. It was shown that the CVs of the UPD a...

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Bibliographic Details
Main Author: V. D. JOVIC
Format: Article
Language:English
Published: Serbian Chemical Society 2006-04-01
Series:Journal of the Serbian Chemical Society
Subjects:
AlCl3–EtMeImCl
room temperature molten salt
UPD and OPD
Cu(111)
(sqrt3 x sqrt3) R30º
progressive 3D nucleation and growth
Al–Cu surface alloying
Online Access:http://www.shd.org.yu/HtDocs/SHD/Vol71/No4/JSCS_V71_No4-06.pdf

Internet

http://www.shd.org.yu/HtDocs/SHD/Vol71/No4/JSCS_V71_No4-06.pdf

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