Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates

Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates

This work compares the deposition of aluminum nitride by magnetron sputtering on silicon to multilayer ceramic substrates. The variation of sputter parameters in a wide range following a fractional factorial experimental design generates diverse crystallographic properties of the layers. Crystal gro...

Full description

Bibliographic Details
Main Authors: Heike Bartsch, Rolf Grieseler, Jose Mánuel, Jörg Pezoldt, Jens Müller
Format: Article
Language:English
Published: MDPI AG 2018-08-01
Series:Coatings
Subjects:
low temperature cofired ceramics
LTCC
aluminum nitride
high-rate magnetron sputtering
stress reduction
substrate influence on nucleation
cubic aluminum nitride
Online Access:http://www.mdpi.com/2079-6412/8/8/289

Internet

http://www.mdpi.com/2079-6412/8/8/289

Similar Items