Fabrication of Slanted Cu Nanopillars with Uniform Arrays

Fabrication of Slanted Cu Nanopillars with Uniform Arrays

Slanted Cu nanopillars with uniform arrays were fabricat‐ ed using slanted Si channel structures as templates. A slanted plasma etching technique was employed, utilizing a Faraday cage system for the formation of these slanted channel structures. The angle of the slanted channel structures was accur...

Full description

Bibliographic Details
Main Authors: Sung-Woon Cho, Hae-Min Lee, Jun-Hyun Kim, Jeong Geun Bak, Chang-Koo Kim
Format: Article
Language:English
Published: SAGE Publishing 2016-02-01
Series:Nanomaterials and Nanotechnology
Subjects:
Slanted Nanopillars
Slanted Plasma Etching
Faraday Cage
Uniform Array
Online Access:http://www.intechopen.com/journals/nanomaterials_and_nanotechnology/fabrication-of-slanted-cu-nanopillars-with-uniform-arrays

Internet

http://www.intechopen.com/journals/nanomaterials_and_nanotechnology/fabrication-of-slanted-cu-nanopillars-with-uniform-arrays

Similar Items