Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing
In this manuscript, we outline a reliable procedure to manufacture photonic nanostructures from single-crystal diamond (SCD). Photonic nanostructures, in our case SCD nanopillars on thin (<1 <inline-formula> <math display="inline"> <semantics> <mi mathvariant=&q...
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doaj-4fca5d099d7440acafda2ee86d1453f82020-11-25T02:15:41ZengMDPI AGMicromachines2072-666X2019-10-01101171810.3390/mi10110718mi10110718Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale SensingMariusz Radtke0Richard Nelz1Abdallah Slablab2Elke Neu3Faculty of Natural Sciences and Technology, Saarland University, Physics, Campus E2.6, 66123 Saarbrücken, GermanyFaculty of Natural Sciences and Technology, Saarland University, Physics, Campus E2.6, 66123 Saarbrücken, GermanyFaculty of Natural Sciences and Technology, Saarland University, Physics, Campus E2.6, 66123 Saarbrücken, GermanyFaculty of Natural Sciences and Technology, Saarland University, Physics, Campus E2.6, 66123 Saarbrücken, GermanyIn this manuscript, we outline a reliable procedure to manufacture photonic nanostructures from single-crystal diamond (SCD). Photonic nanostructures, in our case SCD nanopillars on thin (<1 <inline-formula> <math display="inline"> <semantics> <mi mathvariant="sans-serif">μ</mi> </semantics> </math> </inline-formula>m) platforms, are highly relevant for nanoscale sensing. The presented top-down procedure includes electron beam lithography (EBL) as well as reactive ion etching (RIE). Our method introduces a novel type of inter-layer, namely silicon, that significantly enhances the adhesion of hydrogen silsesquioxane (HSQ) electron beam resist to SCD and avoids sample charging during EBL. In contrast to previously used adhesion layers, our silicon layer can be removed using a highly-selective RIE step, which is not damaging HSQ mask structures. We thus refine published nanofabrication processes to ease a higher process reliability especially in the light of the advancing commercialization of SCD sensor devices.https://www.mdpi.com/2072-666X/10/11/718top-down nanofabricationsingle-crystal diamondhsqelectron beam lithographyinductively coupled-reactive ion etching (icp-rie) |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Mariusz Radtke Richard Nelz Abdallah Slablab Elke Neu |
spellingShingle |
Mariusz Radtke Richard Nelz Abdallah Slablab Elke Neu Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing Micromachines top-down nanofabrication single-crystal diamond hsq electron beam lithography inductively coupled-reactive ion etching (icp-rie) |
author_facet |
Mariusz Radtke Richard Nelz Abdallah Slablab Elke Neu |
author_sort |
Mariusz Radtke |
title |
Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing |
title_short |
Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing |
title_full |
Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing |
title_fullStr |
Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing |
title_full_unstemmed |
Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing |
title_sort |
reliable nanofabrication of single-crystal diamond photonic nanostructures for nanoscale sensing |
publisher |
MDPI AG |
series |
Micromachines |
issn |
2072-666X |
publishDate |
2019-10-01 |
description |
In this manuscript, we outline a reliable procedure to manufacture photonic nanostructures from single-crystal diamond (SCD). Photonic nanostructures, in our case SCD nanopillars on thin (<1 <inline-formula> <math display="inline"> <semantics> <mi mathvariant="sans-serif">μ</mi> </semantics> </math> </inline-formula>m) platforms, are highly relevant for nanoscale sensing. The presented top-down procedure includes electron beam lithography (EBL) as well as reactive ion etching (RIE). Our method introduces a novel type of inter-layer, namely silicon, that significantly enhances the adhesion of hydrogen silsesquioxane (HSQ) electron beam resist to SCD and avoids sample charging during EBL. In contrast to previously used adhesion layers, our silicon layer can be removed using a highly-selective RIE step, which is not damaging HSQ mask structures. We thus refine published nanofabrication processes to ease a higher process reliability especially in the light of the advancing commercialization of SCD sensor devices. |
topic |
top-down nanofabrication single-crystal diamond hsq electron beam lithography inductively coupled-reactive ion etching (icp-rie) |
url |
https://www.mdpi.com/2072-666X/10/11/718 |
work_keys_str_mv |
AT mariuszradtke reliablenanofabricationofsinglecrystaldiamondphotonicnanostructuresfornanoscalesensing AT richardnelz reliablenanofabricationofsinglecrystaldiamondphotonicnanostructuresfornanoscalesensing AT abdallahslablab reliablenanofabricationofsinglecrystaldiamondphotonicnanostructuresfornanoscalesensing AT elkeneu reliablenanofabricationofsinglecrystaldiamondphotonicnanostructuresfornanoscalesensing |
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1724894604755468288 |