The Structure, Morphology, and Mechanical Properties of Ta-Hf-C Coatings Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

The Structure, Morphology, and Mechanical Properties of Ta-Hf-C Coatings Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

Ta, Hf, TaC<sub>x</sub>, HfC<sub>x</sub>, and Ta<sub>x</sub>Hf<sub>1-x</sub>C<sub>y</sub> coatings were deposited by reactive pulsed Direct Current (DC) magnetron sputtering of Ta or Hf pure metallic targets in Ar plus CH<sub>4</su...

Full description

Bibliographic Details
Main Authors: Alexis de Monteynard, Huan Luo, Mohamed Chehimi, Jaafar Ghanbaja, Sofiane Achache, Manuel François, Alain Billard, Frédéric Sanchette
Format: Article
Language:English
Published: MDPI AG 2020-02-01
Series:Coatings
Subjects:
uhtcs: tem microscopy
ta-hf-c coatings
reactive magnetron sputtering
Online Access:https://www.mdpi.com/2079-6412/10/3/212

Internet

https://www.mdpi.com/2079-6412/10/3/212

Similar Items