Fabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching

In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out wit...

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Bibliographic Details
Main Authors: P. Heydari, A. R. Asgharpour, M. Nazoktabar, M. Zahedinejad
Format: Article
Language:English
Published: Nanoscience and Nanotechnology Research Center, University of Kashan 2014-10-01
Series:Journal of Nanostructures
Subjects:
Online Access:http://jns.kashanu.ac.ir/article_8485_b493122d45d6a4429f54621186c4ca46.pdf