Metastable ultrathin crystal in thermally grown SiO2 film on Si substrate

A silicon dioxide film on a silicon substrate is the most essential element in semiconductor devices and various advanced materials. We have elucidated the atomic structure of SiO2 films using low-dose scanning transmission electron microscopy (STEM). We have visualized a metastable crystalline SiO2...

Full description

Bibliographic Details
Main Authors: Koji Kimoto, Hiroki Tanaka, Daisuke Matsushita, Kosuke Tatsumura, Shiro Takeno
Format: Article
Language:English
Published: AIP Publishing LLC 2012-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4768269