A new stable, crystalline capping material for topological insulators

A new stable, crystalline capping material for topological insulators

To preserve the high quality topological surface state after air exposure without degradation, it is crucial to identify an effective capping layer. In this study, we report an effective capping layer obtained by crystallizing Se. Upon extended exposure to ultrahigh vacuum or humid air, we show by u...

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Bibliographic Details
Main Authors: H. Y. Lin, C. K. Cheng, K. H. M. Chen, C. C. Tseng, S. W. Huang, M. T. Chang, S. C. Tseng, M. Hong, J. Kwo
Format: Article
Language:English
Published: AIP Publishing LLC 2018-06-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5029706

Internet

http://dx.doi.org/10.1063/1.5029706

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