Optical and Structural Properties of Silicon Nanocrystals Embedded in SiOx Matrix Obtained by HWCVD
The interest in developing optoelectronic devices integrated in the same silicon chip has motivated the study of Silicon nanocrystals (Si-ncs) embedded in SiOx (nonstoichiometric silicon oxides) films. In this work, Si-ncs in SiOx films were obtained by Hot Wire Chemical Vapor Deposition (HWCVD) at...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2012-01-01
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| Series: | Journal of Nanomaterials |
| Online Access: | http://dx.doi.org/10.1155/2012/368268 |