Faceting control in core-shell GaN micropillars using selective epitaxy
We report on the fabrication of large-area, vertically aligned GaN epitaxial core-shell micropillar arrays. The two-step process consists of inductively coupled plasma (ICP) etching of lithographically patterned GaN-on-Si substrate to produce an array of micropillars followed by selecti...
| Main Authors: | , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2014-10-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.4899296 |