Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .

Bibliographic Details
Main Authors: Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, Sanjay Krishna
Format: Article
Language:English
Published: Nature Publishing Group 2021-02-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-021-84101-3

Internet

https://doi.org/10.1038/s41598-021-84101-3

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