Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth Conditions

Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth Conditions

Abstract Here, we report a novel method for low-temperature synthesis of monolayer graphene at 450 °C on a polycrystalline bimetal Ni-Au catalyst. In this study, low-temperature chemical vapor deposition synthesis of graphene was performed at 450 °C on codeposited Ni-Au which shows successful monola...

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Bibliographic Details
Main Authors: Joshua Tracy, Otto Zietz, Samuel Olson, Jun Jiao
Format: Article
Language:English
Published: SpringerOpen 2019-10-01
Series:Nanoscale Research Letters
Subjects:
Codeposition
Ni-Au bimetal catalyst
Inductively coupled plasma chemical vapor deposition (ICPCVD)
Low-temperature graphene growth
Online Access:http://link.springer.com/article/10.1186/s11671-019-3156-y

Internet

http://link.springer.com/article/10.1186/s11671-019-3156-y

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