Application of an Electrical Low Pressure Impactor (ELPI) for Residual Particle Measurement in an Epitaxial Growth Reactor

Application of an Electrical Low Pressure Impactor (ELPI) for Residual Particle Measurement in an Epitaxial Growth Reactor

The purpose of this study was to determine the feasibility of using an electrical low pressure impactor (ELPI) for analyzing residual particles in a Si epitaxial growth process chamber and establish an application technique. Prior to experimental measurements, some preliminary works were conducted,...

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Bibliographic Details
Main Authors: Seungjae Lee, Dongbin Kim, Yujin Cho, Eunmi Kim, Pengzhan Liu, Dong-Bin Kwak, Seungho Keum, Hongkang Lim, Taesung Kim
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Applied Sciences
Subjects:
semiconductor process
process particle
epitaxial growth
electrical low pressure impactor (ELPI)
particle size distribution (PSD)
Online Access:https://www.mdpi.com/2076-3417/11/16/7680

Internet

https://www.mdpi.com/2076-3417/11/16/7680

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