Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH3 and Selective Deposition on Defects of Graphene

Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH3 and Selective Deposition on Defects of Graphene

Bibliographic Details
Main Authors: Minsu Kim, Shunichi Nabeya, Dip K. Nandi, Kazuharu Suzuki, Hyun-Mi Kim, Seong-Yong Cho, Ki-Bum Kim, Soo-Hyun Kim
Format: Article
Language:English
Published: American Chemical Society 2019-06-01
Series:ACS Omega
Online Access:http://dx.doi.org/10.1021/acsomega.9b01003

Internet

http://dx.doi.org/10.1021/acsomega.9b01003

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