Effect of the annealing temperature on dynamic and structural properties of Co2FeAl thin films
10 nm and 50 nm thick Co2FeAl (CFA) thin films have been deposited on thermally oxidized Si(001) substrates by magnetron sputtering using a Tantalum cap layer and were then ex-situ annealed at 415°C, 515°C and 615°C during 15 minutes in vacuum. X-rays diffraction indicates that films CFA are polycr...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2014-07-01
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| Series: | EPJ Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/epjconf/20147502001 |