Design Choices for Next-Generation Neurotechnology Can Impact Motion Artifact in Electrophysiological and Fast-Scan Cyclic Voltammetry Measurements

Design Choices for Next-Generation Neurotechnology Can Impact Motion Artifact in Electrophysiological and Fast-Scan Cyclic Voltammetry Measurements

Implantable devices to measure neurochemical or electrical activity from the brain are mainstays of neuroscience research and have become increasingly utilized as enabling components of clinical therapies. In order to increase the number of recording channels on these devices while minimizing the im...

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Bibliographic Details
Main Authors: Evan N. Nicolai, Nicholas J. Michelson, Megan L. Settell, Seth A. Hara, James K. Trevathan, Anders J. Asp, Kaylene C. Stocking, J. Luis Lujan, Takashi D.Y. Kozai, Kip A. Ludwig
Format: Article
Language:English
Published: MDPI AG 2018-09-01
Series:Micromachines
Subjects:
electrode
artifact
electrophysiology
electrochemistry
fast-scan cyclic voltammetry (FSCV)
neurotechnology
neural interface
neuromodulation
neuroprosthetics
brain-machine interfaces
Online Access:http://www.mdpi.com/2072-666X/9/10/494

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http://www.mdpi.com/2072-666X/9/10/494

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