TID Circuit Simulation in Nanowire FETs and Nanosheet FETs

In this study, the effects of the total ionizing dose (TID) on a nanowire (NW) field-effect transistor (FET) and a nanosheet (NS) FET were analyzed. The devices have Gate-all-around (GAA) structure that are less affected by TID effects because GAA structures have better gate controllability than pre...

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Bibliographic Details
Main Authors: Jongwon Lee, Myounggon Kang
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Electronics
Subjects:
Online Access:https://www.mdpi.com/2079-9292/10/8/956