Fabrication and Characterization of Low-Threshold Single Fundamental Mode VCSELs With Dielectric DBR Mirror
The SiO<sub>2</sub>/SiN<sub>x</sub> dielectric film stacks deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) are employed on the top of the oxide-confined vertical-cavity surface-emitting lasers (VCSELs). The reflecting mirror characterist...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2021-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9457164/ |